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Location: 1 North Coast Drive, Singapore 757432
Department: Product Integration Engineering (PIE), Metrology
Project Title: Deployment of improvedMetrology tool matching methodology using machine learningbased scatterometry to production environment
Description: Scatterometry is a technique that uses light to measure critical dimension of a post-etch structure during wafer fabrication. Machine Learning (ML)-based scatterometry uses supervised learning model to evaluate the measurement value from the light information.With the advancement in technology, improving metrology tool matching is always challenging in production with the tighten of process control limit. ML-based scatterometry is used to overcome the challenge.
Scope: The student will be introduced to scatterometry measurement technique. He/She will be able to learn the application of supervised learning technique. He/She will have to analyse the collected data and spectra before further optimizing the ML models. And then these models will be deployed to the production environment.
Deliverable: To deploy the improved tool matching methodology to production environment for cost saving and enhances inline measurement performance and quality
Skillset Require: Students pursuing Diploma\'s degree in engineering
Course of interests: Engineering
Duration Period: 4 months
About Micron Technology, Inc.
We are an industry leader in innovative memory and storage solutions transforming how the world uses information to enrich life for all. With a relentless focus on our customers, technology leadership, and manufacturing and operational excellence, Micron delivers a rich portfolio of high-performance DRAM, NAND, and NOR memory and storage products through our Micron\xc2\xae and Crucial\xc2\xae brands. Every day, the innovations that our people create fuel the data economy, enabling advances in artificial intelligence and 5G applications that unleash opportunities \xe2\x80\x94 from the data center to the intelligent edge and across the client and mobile user experience.
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